Ultra-Thin Titanium Film (Ti)
Price: On request
Get pricing and product details from fem Research Institute.
High-purity electroplated Copper (Cu) layer for electrochemical energy storage, catalysis and interfacial engineering research.
Available in the following material classes: metals, metal alloys.
Applied on metal substrates, custom substrates, with layer thickness in the nm to µm range.
Thickness, substrate, geometry can be tailored on request.
Electrode Material
Copper
Material Form
Electroplated metal layer
Purity
Research-grade materials
Material Classes
Metals, Metal alloys
Available Substrates
Custom, Metal substrates
Customizable Parameters
Geometry, Substrate, Thickness
Thickness
nm to µm range
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Price: On request

Price on request
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Price: On request
Price: On request
Price: On request
Price: On request