High-purity ultra-thin Tungsten (W) film for advanced materials and electrochemical research, engineered to a precise and reproducible surface.

Applications

• high-temperature coatings
• diffusion barriers in microelectronics
• hard and wear-resistant coatings (e.g. WC)
• electrochromic devices (WO3)
• catalysis
• surface science under extreme conditions

Materials and composition

Available in the following material classes: metals, nitrides (e.g. WN), carbides (e.g. WC), oxides (e.g. WO3).

Substrate and thickness

Deposited on glass, silicon, metal substrates, custom substrates, with thickness in the nm to µm range.