Ultra-Thin Titanium Film (Ti)
fem Research Institute
High-purity ultra-thin Tantalum (Ta) film for advanced materials and electrochemical research, engineered to a precise and reproducible surface.
Available in the following material classes: metals, nitrides (e.g. TaN), carbides (e.g. TaC), oxides (e.g. Ta2O5).
Deposited on glass, silicon, metal substrates, custom substrates, with thickness in the nm to µm range.
Thickness, substrate, composition can be tailored on request.
Electrode Material
Tantalum
Material Classes
Metals, Nitrides, Carbides, Oxides
Material Form
Thin film coating
Available Substrates
Glass, Silicon, Metal substrates, Custom
Purity
Research-grade high purity
Thickness
nm to µm range
Customizable Parameters
Thickness, Substrate, Composition
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