Boron-Doped Diamond Plate (BDD Plate)
Redoxme
Particle Boron-Doped Diamond (BDD) Electrode
Price: On request
Description
This particle boron-doped diamond electrode material is supplied in graded particle and mesh formats for electrochemical systems requiring a large active surface area. Boron-doped diamond films provide a wide potential window, low background current and high electrochemical stability. Main features: large area, high uniformity, high electrochemical active area, strong oxidation performance, high oxygen evolution potential, high conductivity and high specific surface area. Application areas: electrochemical degradation of industrial organic wastewater, high-salt and difficult-to-biodegrade streams, oilfield wastewater, electrolysis, electrochemical synthesis, environmental and industrial sensors, medical and household disinfection and PCB micro-etching waste regeneration.
Specifications
General Electrode
Electrode Material
Boron-Doped Diamond (BDD)
Available Substrates
Silicon, Niobium, Tantalum, Foam metal, Foam ceramic
Material Form
Particle
Electrocatalytic Reaction Rate Constant
10^-4-10^-3 cm/s
Oxygen Evolution Potential
2.5-2.9 V
Hydrogen Evolution Potential
-2.0--1.0 V
Charge Transfer Impedance
<50 Ω
Grain Size (BDD)
0.25-600 µm (15000-30 mesh)
Coating Thickness
8-20 µm
Boron Doping Level
10^19 cm^-3
RoHS Compliance
Yes
Miniaturized Electrochemical Platforms
Conductivity (S/m)
>10,000 S/m
Current Collectors
Mesh count
45/50 mesh, 50/60 mesh, 60/70 mesh, 70/80 mesh, 80/100 mesh, 100/120 mesh, 120/170 mesh, 170/200 mesh, 200/400 mesh
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